國家衛生研究院 NHRI:Item 3990099045/7580
English  |  正體中文  |  简体中文  |  Items with full text/Total items : 12145/12927 (94%)
Visitors : 855379      Online Users : 1063
RC Version 6.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
    •  Adv. Search
    Home ‧ Login ‧ Upload ‧ Help ‧ About ‧ Administer Goto mobile version


    Please use this identifier to cite or link to this item: http://ir.nhri.org.tw/handle/3990099045/7580


    Title: Application of TEM for distinguishing the primary and secondary abrasives of undiluted CMP slurry
    Authors: Sun, CJ;Tai, LA;Sharma, P;Ko, YF;Chen, YC;Chu, CH;Hsieh, YF;Yang, CS;Yew, TR
    Contributors: Center for Nanomedicine Research
    Abstract: Determination of morphology and size distribution of primary and secondary abrasives of slurry is essential for optimization of CMP performance. The undiluted slurry was characterized in liquid phase using silicon based Nano-pipettes in TEM. To validate utility of Nano-pipettes, comparatively quantitative analysis was performed by cryo-TEM technique.
    Date: 2013-07
    Relation: 20th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits. 2013 Jul:400-403.
    Link to: http://dx.doi.org/10.1109/ipfa.2013.6599189
    Cited Times(WOS): https://www.webofscience.com/wos/woscc/full-record/WOS:000329045700073
    Cited Times(Scopus): http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84885625665
    Appears in Collections:[Chung-Shi Yang] Conference Papers/Meeting Abstract

    Files in This Item:

    File Description SizeFormat
    SCP84885625665.pdf634KbAdobe PDF185View/Open


    All items in NHRI are protected by copyright, with all rights reserved.

    Related Items in TAIR

    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback